3Dresyn NMF HAR1 Bio, Biocompatible High Aspect Ratio ultra rigid photopolymer for nano and micro fabrication

SKU: P20792

Color: Clear
Size: 100 grams
Free samples of our Fine Tuners will be sent if necessary for custom adjustment of photocuring speed
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Sale price€150.00

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Description

3Dresyn NMF HAR1 Bio has these features and benefits:

    • UV & EB curable organic high aspect ratio & ultra rigid photopolymer for nano and micro fabrication, such as printing of ultra rigid stamps for Nano Imprinting lithography NIL and negative photoresists for standard UV lithography & PCB technology processing, UV patterning of core and cladding
    • resin with properties similar to quartz glass
    • UV curable: excellent photoreactivity at 250-410 nm with minimum energy dosage
    • Electron beam EB curable
    • compatible and blendable with our 3Dreyns for nano & micro fabrication  
    • Shore hardness D90
    • biocompatible, ultra safe without any toxic pictograms
    • medium tensile and flexural strength <40 MPa
    • ultra rigid (Young modulus 4000-6000 MPa)
    • elongation <1%
    • high temperature resistance up to 290 ºC (short term) without deformation
    • High deflection temperature >290ºC
    • imprint Temperature > 160ºC
    • synthetic resin source
    • durable
    • high impact/shattering resistance
    • excellent balance of low viscosity for easy imprinting and low penetration  
    • high refractive index 1.45-1.55
    • very high resolution (printing resolution of less than 10 nm)
    • medium shrinkage <13%
    • organo-tin free
    • high optical clarity
    • high durability, non degradable
    • excellent bonding, low risk of debonding
    • medium-high mechanical properties, with low risk of cracking
    • very low degassing at high vacuum 
    • ultra low oxygen sensitivity despite its ultra low viscosity
    • high mechanical stability
    • long shelf life of 1 year
    • excellent spin coating application 
    • excellent etching with Reactive Ion Etching
    • excellent stability and chemical resistance to a wide range of wet chemistries used in the clean room
    • ultra low penetration
    • low surface tension with good release and demolding properties
    • 100% organic (free of inorganic materials) 
    • optionally it can contain hydroxyl groups for bonding release agents, such as perfluorodecyltrichlorosilane (FDTS)
    • no thermal treatment is required
    • easy processing with standard lithography equipment
    • easy removal of uncured resin with ketones, alcohols and esters

    Applications

    • easy & cost effective transparent ultra rigid stamp fabrication, alternative to quartz or electroplated stamps
    • ideal for mass sensors based on UV-NIL, ALD and RIE

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